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KR101691792B1 - Enantiomerically pure binaphtol derivatives and method for preparing the same - Google Patents

Enantiomerically pure binaphtol derivatives and method for preparing the same Download PDF

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KR101691792B1
KR101691792B1 KR1020130081492A KR20130081492A KR101691792B1 KR 101691792 B1 KR101691792 B1 KR 101691792B1 KR 1020130081492 A KR1020130081492 A KR 1020130081492A KR 20130081492 A KR20130081492 A KR 20130081492A KR 101691792 B1 KR101691792 B1 KR 101691792B1
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장래규
안윤수
정희정
가혜림
맹주완
고영국
이영희
이광재
김준서
이현일
윤흥식
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주식회사 아미노로직스
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    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C275/00Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups
    • C07C275/28Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C275/42Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton being further substituted by carboxyl groups
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    • C07C237/00Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by amino groups
    • C07C237/28Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by amino groups having the carbon atom of at least one of the carboxamide groups bound to a carbon atom of a non-condensed six-membered aromatic ring of the carbon skeleton
    • C07C237/42Carboxylic acid amides, the carbon skeleton of the acid part being further substituted by amino groups having the carbon atom of at least one of the carboxamide groups bound to a carbon atom of a non-condensed six-membered aromatic ring of the carbon skeleton having nitrogen atoms of amino groups bound to the carbon skeleton of the acid part, further acylated
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Abstract

본 발명은 하기 화학식 1의 화합물 1, 1a ((S) 형) 및 1b ((R) 형)와 이들의 제조 방법에 관한 것이다.
[화학식 1]

Figure 112013062420563-pat00036
Figure 112013062420563-pat00037
Figure 112013062420563-pat00038

1 1a 1b
상기 화학식 1의 신규 화합물은 2,2'-바이나프톨-3-알데히드 유도체인 하기 화학식 6의 화합물 6, 6a ((S) 형)와 6b ((R) 형)를 제조함에 있어서 중요한 중간체로 사용된다. 또한, 본 발명은 상기 화학식 1의 화합물을 매우 안전한 방법으로 저렴하게 제조하는 방법을 제공한다.
[화학식 6]
Figure 112013062420563-pat00039
Figure 112013062420563-pat00040
Figure 112013062420563-pat00041

6 6a 6b The present invention relates to compounds 1, 1a ((S) type) and 1b ((R) type) represented by the following general formula (1) and a process for their preparation.
[Chemical Formula 1]
Figure 112013062420563-pat00036
Figure 112013062420563-pat00037
Figure 112013062420563-pat00038

1 1a 1b
The novel compounds of formula 1 are used as important intermediates in the preparation of compounds 6, 6a ((S) type) and 6b ((R) type) which are derivatives of 2,2'-binaphthol-3-aldehyde do. The present invention also provides a method for producing the compound of formula (1) at a low cost in a very safe manner.
[Chemical Formula 6]
Figure 112013062420563-pat00039
Figure 112013062420563-pat00040
Figure 112013062420563-pat00041

6 6a 6b

Description

광학적으로 순수한 바이나프톨 유도체의 제조 방법 {ENANTIOMERICALLY PURE BINAPHTOL DERIVATIVES AND METHOD FOR PREPARING THE SAME} TECHNICAL FIELD [0001] The present invention relates to an optically pure binaphthol derivative and a method for producing the optically pure binaphthol derivative,

본 발명은 2,2'-바이나프톨-3-알데히드(2,2'-binaphthol-3-aldehyde) 유도체의 화합물의 제조 과정에서 중요한 중간체로 사용되는 신규 화합물 및 그의 제조 방법에 관한 것이다. The present invention relates to a novel compound used as an important intermediate in the preparation of a compound of 2,2'-binaphthol-3-aldehyde derivative, and a process for preparing the same.

2,2'-바이나프톨-3-알데히드의 2' 히드록시기의 수소가 선택적으로 치환된 화합물들은 다양한 용도로 사용되고 있다. 이러한 화합물들 중에서, 이민 결합을 통하여 키랄 아미노 알코올 또는 아미노산의 키랄성을 인식하여 이들을 각각의 광학이성질체로 분리하거나, L-아미노산을 D-아미노산으로 또는 D-아미노산을 L-아미노산으로 변환시키는데 매우 유용한 하기 화학식 6의 화합물은 본 발명의 발명자들에 의해 개발되어 특허 등록(한국특허등록 제10-0661280호)된 바 있다. Compounds in which the hydrogen of the 2'hydroxy group of the 2,2'-binaphthol-3-aldehyde is selectively substituted have been used for various purposes. Among these compounds, it is possible to recognize the chiral properties of chiral amino alcohols or amino acids through imine linkage, to separate them into their respective optical isomers, or to be useful for converting L-amino acids to D-amino acids or D-amino acids to L-amino acids The compound of Chemical Formula 6 was developed by the inventors of the present invention and patented (Korean Patent Registration No. 10-0661280).

[화학식 6][Chemical Formula 6]

Figure 112013062420563-pat00001
Figure 112013062420563-pat00002
Figure 112013062420563-pat00003
Figure 112013062420563-pat00001
Figure 112013062420563-pat00002
Figure 112013062420563-pat00003

6 6a 6b    6 6a 6b

그런데, 이러한 2,2'-바이나프톨-3-알데히드의 2' 히드록시기의 수소를 치환하는 종래의 기술에 의하면, 상기 2' 히드록시기에 대한 선택성이 낮아서 2 히드록시기의 수소에 대한 치환체와 2' 히드록시기의 수소에 대한 치환체가 혼합된 생성물이 얻어지며, 특히 2 히드록시기의 수소에 대한 치환체가 더 많이 생성된다. 이러한 혼합물은 분리가 쉽지 않아서 목적물의 제조 효율이 크게 저하되는 문제가 있어서 2' 히드록시기의 수소에 대한 치환기를 얻기 위해 2 히드록시기를 보호기로 보호한 후 알킬화 반응을 진행해야 하는 어려움이 있었다. 따라서, 2' 히드록시기의 수소에 대한 선택성을 높여서 부산물이 생성되지 않게 하는 기술이 요구되었다.However, according to the conventional technique of replacing the hydrogen of the 2'hydroxy group of the 2,2'-binaphthol-3-aldehyde, the selectivity to the 2'hydroxy group is low and the substituent for the hydrogen of the 2hydroxy group and the substituent for the hydrogen of the 2'hydroxy group A product in which a substituent for hydrogen is mixed is obtained, and in particular, a substituent for hydrogen of 2hydroxy groups is generated more. Since such a mixture is not easy to separate, there is a problem that the production efficiency of an object is greatly deteriorated. Therefore, in order to obtain a substituent for hydrogen of 2 'hydroxy group, it has been difficult to carry out an alkylation reaction after protecting 2 hydroxyl groups with a protecting group. Therefore, there has been a demand for a technique for increasing the selectivity of the 2'hydroxy group to hydrogen so as not to produce a by-product.

한편, 본 발명의 신규 화합물인 바이나프톨 유도체는 하기 화학식 1로 표시되는데, 이러한 화합물의 제조에는 하기 화학식 2의 화합물이 사용될 수 있다.Meanwhile, a novel compound of the present invention, a binaphthol derivative, is represented by the following formula (1).

[화학식 1] [Chemical Formula 1]

Figure 112013062420563-pat00004
Figure 112013062420563-pat00005
Figure 112013062420563-pat00006
Figure 112013062420563-pat00004
Figure 112013062420563-pat00005
Figure 112013062420563-pat00006

1 1a 1b    1 1a 1b

[화학식 2](2)

Figure 112013062420563-pat00007
Figure 112013062420563-pat00008
Figure 112013062420563-pat00009
Figure 112013062420563-pat00007
Figure 112013062420563-pat00008
Figure 112013062420563-pat00009

2 2a 2b    2 2a 2b

또한, 종래의 기술에서 사용한 출발물질인 광학적으로 순수한 바이나프톨이 비교적 고가이므로, 보다 저렴한 물질을 사용하여 광학적으로 순수한 바이나프톨 유도체를 제조하는 방법의 개발도 필요하였다.In addition, since optically pure binaphthol, which is a starting material used in the prior art, is relatively expensive, development of a method for producing an optically pure binaphthol derivative using a less expensive material has also been required.

본 발명은, 종래기술의 상기와 같은 문제를 해결하기 위한 것으로서, 2,2'-바이나프톨-3-알데히드를 사용하는 대신, 화학식 2의 화합물인 2,2'-바이나프톨-3-카르복실산을 사용하여 2' 히드록시기의 수소 위치에 선택적으로 다양한 치환기를 도입하여 제조되는 신규 화합물인 화학식 1의 바이나프톨 유도체를 제공하는 것을 목적으로 한다.DISCLOSURE OF THE INVENTION The present invention has been made to solve the above-mentioned problems of the prior art, and it is an object of the present invention to provide a process for producing 2,2'-binaphthol-3-carboxylate Which is a novel compound prepared by selectively introducing various substituent groups to the hydrogen position of the 2'hydroxy group using an acid.

또한, 상기 화학식 1의 바이나프톨 유도체를 위험한 물질을 사용하지 않고 안전한 방법에 의해 경제적으로 제조하는 방법을 제공하는 것을 목적으로 한다. It is another object of the present invention to provide a method for economically preparing a binaphthol derivative of formula (1) by a safe method without using dangerous substances.

본 발명은 하기 화학식 1의 화합물을 제공한다.The present invention provides a compound of formula (1).

[화학식 1] [Chemical Formula 1]

Figure 112013062420563-pat00010
Figure 112013062420563-pat00011
Figure 112013062420563-pat00012
Figure 112013062420563-pat00010
Figure 112013062420563-pat00011
Figure 112013062420563-pat00012

1 1a 1b    1 1a 1b

상기 식에서, X 및 Y는 각각 독립적으로 수소; 할로겐; 아미노; 니트로; 시아노; 할로겐, 히드록시, 아미노, 시아노, 니트로 및 C6~C10의 아릴로 이루어진 군으로부터 선택되는 하나 이상의 치환기로 치환 또는 비치환된 C1~C10의 알킬; C1~C10의 알킬카르보닐; C5~C10의 아릴; 및 C1~C10의 알콕시로 이루어진 군으로부터 선택되며; n 및 m은 0~5의 정수이고; R1은 수소 또는 산소이며; R2는 -NO2, -NH(NHBOCNBOC), -NHCX'R3, -NHS(=O)aR3, 또는 -NHPO(OH)R3이며, 상기에서 X'는 산소 또는 황이고, a는 1 또는 2이며, 상기 R3는 수소; 할로겐으로 치환 또는 비치환된 C1~C10의 알킬; -NR4R5; 또는 OR6이고, R4 내지 R6은 각각 독립적으로 수소; 할로겐으로 치환 또는 비치환된 C1~C10의 알킬; 또는 할로겐, 니트로, C1~C5의 알킬기, C1~C5의 알콕시 및 C1~C5의 퍼플루오로알킬기로 이루어진 군으로부터 선택되는 하나 이상의 치환기로 치환 또는 비치환된 C5~C12의 아릴로부터 선택된다.Wherein X and Y are each independently selected from the group consisting of hydrogen; halogen; Amino; Nitro; Cyano; Halogen, hydroxy, amino, cyano, nitro and C 6 ~ C at least one selected from the group consisting of aryl substituted with a substituent of 10 or unsubstituted C 1 ~ C 10 alkyl; C 1 -C 10 alkylcarbonyl; Aryl of C 5 ~ C 10; And C 1 -C 10 alkoxy; n and m are integers from 0 to 5; R < 1 > is hydrogen or oxygen; R 2 is -NO 2 , -NH (NHBOCNBOC), -NHCX'R 3 , -NHS (═O) aR 3 or -NHPO (OH) R 3 wherein X 'is oxygen or sulfur and a is 1 or 2, and R < 3 > is hydrogen; C 1 -C 10 alkyl substituted or unsubstituted with halogen; -NR 4 R 5 ; Or OR < 6 > and R < 4 > to R < 6 > are each independently hydrogen; C 1 -C 10 alkyl substituted or unsubstituted with halogen; Or halogen, nitro, C 1 ~ C 5 alkyl group, C 1 ~ C 5 alkoxy and C 1 ~ C 5 with one or more substituents selected from the group consisting of a perfluoroalkyl group-substituted or unsubstituted C 5 ~ C Lt ; / RTI >

본 발명은 또한 상기 화학식 2의 화합물과 하기 화학식 3의 화합물을 염기의 존재 하에 반응시키는 단계를 포함하는 상기 화학식 1의 화합물의 제조 방법을 제공한다.The present invention also provides a process for preparing the compound of formula (1), which comprises reacting the compound of formula (2) and the compound of formula (3) in the presence of a base.

[화학식 2](2)

Figure 112013062420563-pat00013
Figure 112013062420563-pat00014
Figure 112013062420563-pat00015
Figure 112013062420563-pat00013
Figure 112013062420563-pat00014
Figure 112013062420563-pat00015

2 2a 2b    2 2a 2b

[화학식 3](3)

Figure 112013062420563-pat00016
Figure 112013062420563-pat00016

3     3

상기 식에서, X, Y, n, m 및 R2는 상기 정의한 바와 동일하며, Z는 할로겐이다. Wherein X, Y, n, m and R 2 are the same as defined above, and Z is halogen.

본 발명의 화학식 2의 화합물을 사용하는 경우, 2,2'-바이나프톨-3-카르복실산의 2' 히드록시기의 수소 위치에 다양한 치환기를 매우 효율적으로 도입할 수 있다.When the compound of formula (2) of the present invention is used, various substituents can be introduced very efficiently at the hydrogen position of the 2'hydroxy group of 2,2'-binaphthol-3-carboxylic acid.

또한, 본 발명의 제조 방법은 상기 화학식 1의 바이나프톨 유도체를 매우 안전하고 경제적으로 제조하는 방법을 제공한다. 따라서, 이러한 방법은 산업적인 규모의 생산라인에 적용될 경우 매우 큰 효과를 제공할 수 있다.In addition, the process of the present invention provides a method for producing the binaphthol derivative of Formula 1 very safely and economically. Therefore, this method can provide a very large effect when applied to an industrial scale production line.

본 발명은 하기 화학식 1의 화합물과 그의 제조 방법에 관한 것이다. The present invention relates to a compound represented by the following general formula (1) and a process for producing the same.

[화학식 1] [Chemical Formula 1]

Figure 112013062420563-pat00017
Figure 112013062420563-pat00018
Figure 112013062420563-pat00019
Figure 112013062420563-pat00017
Figure 112013062420563-pat00018
Figure 112013062420563-pat00019

1 1a 1b    1 1a 1b

상기 식에서, X, Y, n, m, R1 및 R2는 상기 정의한 바와 동일하다.Wherein X, Y, n, m, R 1 and R 2 are the same as defined above.

상기 화학식 1의 화합물은 2,2'-바이나프톨-3-알데히드 유도체인 상기 화학식 6의 화합물을 제조함에 있어서 중요한 중간체로 유용하게 사용될 수 있다.The compound of Formula 1 may be useful as an intermediate in the preparation of the compound of Formula 6, which is a 2,2'-binaphthol-3-aldehyde derivative.

본 발명은 또한 상기 화학식 2의 화합물 2와 상기 화학식 3의 화합물 3을 염기의 존재 하에 반응시키는 단계를 포함하는 상기 화학식 1의 화합물 1의 제조 방법을 제공한다.The invention also provides a process for the preparation of a compound 1 of Formula 1 which comprises reacting the compound 3 of the formula (2) compound 2 and the formula 3 in the presence of a base.

상기의 제조 방법을 반응식으로 나타내면 다음과 같다.The above production method is shown in the following reaction scheme.

[반응식 1][Reaction Scheme 1]

Figure 112013062420563-pat00020
Figure 112013062420563-pat00020

2 3 1 (      2 3 1 ( RR 1One =O)= O)

상기 반응에서 사용될 수 있는 용매로는 N,N-디메틸포름아미드(DMF), 디메틸설폭사이드(DMSO), N-메틸피롤리딘(NMP), 테트라하이드로퓨란(THF), 디클로로메탄 등이며, DMF가 바람직하다. 상기 반응에 사용되는 염기로는 Et3N, NaH, NaOH, KOH, K2CO3, 테트라메틸에틸렌디아민(TMEDA), C1~C4의 소디움 또는 포타시움알콕사이드 등의 유기 또는 무기 염기를 들 수 있으며, NaOH가 바람직하다. 염기의 양은 1~5 당량을 사용하며, 2 당량이 바람직하다. 또한 상기 반응은 -40~30 ℃에서 이루어지며, 상온에서 수행하는 것이 바람직하다.Examples of the solvent which can be used in the reaction include N, N-dimethylformamide (DMF), dimethylsulfoxide (DMSO), N-methylpyrrolidine (NMP), tetrahydrofuran (THF), dichloromethane, . Examples of the base used in the reaction include organic or inorganic bases such as Et 3 N, NaH, NaOH, KOH, K 2 CO 3 , tetramethylethylenediamine (TMEDA), C 1 to C 4 sodium or potassium alkoxide And NaOH is preferred. The amount of the base is 1 to 5 equivalents, preferably 2 equivalents. The reaction is carried out at -40 to 30 ° C., preferably at room temperature.

상기 화학식 2의 화합물 2는 매우 저렴한 하기 화학식 4의 화합물 4와 화학식 5의 화합물 5를 사용하여 공지된 방법 [M. Noji, M. Nakajima and K. Koga. Tetrahedron Lett. 35 (1994), p. 7983-7984.]을 응용 및 개선하여 제조할 수 있다. 즉, 하기 반응은 화합물 4를 THF에 용해한 후, 화합물 5를 첨가한 다음, 이 혼합 용액에 CuCl(OH)-TMEDA를 첨가하고 산소 하에서 반응시켜 진행하는 것을 특징으로 한다 (자세한 내용은 실시예 1에서 설명한다). 하기 화합물 45는 종래의 기술에서 사용되던 고가의 바이나프톨 유도체와는 달리, 저렴하고 대량 구매가 가능하여, 본 발명의 목적 화합물인 화학식 1의 화합물을 경제적으로 제조할 수 있게 한다.Compound 2 of the formula (2) is very cheap known methods using the compound 4 and compound 5 of the general formula (V) of general formula 4 [M. Noji, M. Nakajima and K. Koga. Tetrahedron Lett. 35 (1994), p. 7983-7984. ≪ / RTI > That is, the following reaction is characterized in that compound 4 is dissolved in THF, then compound 5 is added, and then CuCl (OH) -TMEDA is added to the mixed solution and the reaction is carried out under oxygen (for details, ). Unlike the expensive binaphthol derivatives used in the prior art, the following compounds 4 and 5 are cheap and can be purchased in large quantities, making it possible to economically produce the compound of the formula (1) of the present invention.

[화학식 4][Chemical Formula 4]

Figure 112013062420563-pat00021
Figure 112013062420563-pat00021

4         4

[화학식 5][Chemical Formula 5]

Figure 112013062420563-pat00022
Figure 112013062420563-pat00022

5      5

상기 화학식 4 및 5에 있어서, X, Y, n 및 m은 상기 정의한 바와 동일하다.In formulas (4) and (5), X, Y, n and m are as defined above.

상기 화학식 2의 화합물 2의 제조 방법을 반응식으로 표시하면 다음과 같다.The method of preparing the compound 2 of the above formula (2) is shown in the following reaction scheme.

[반응식 2][Reaction Scheme 2]

Figure 112013062420563-pat00023
Figure 112013062420563-pat00023

상기 반응 a는 상기에서 언급한 CuCl(OH)-TMEDA를 사용하는 반응이고, 상기 반응 b는 염기를 사용하여 에스테르를 가수분해하는 반응이며, 이 반응에서 염기 및 용매로는 이 분야에 공지된 것을 제한 없이 사용할 수 있다.The reaction a is a reaction using the above-mentioned CuCl (OH) -TMEDA, and the reaction b is a reaction in which an ester is hydrolyzed using a base. As the base and the solvent in this reaction, Can be used without restrictions.

상기에서 반응 a 및 b는 모두 거의 정량적으로 진행되어 경제적이며, 위험성이 높은 화합물을 사용할 필요가 없으므로 매우 안전하다는 장점을 갖는다. 따라서, 상기와 같은 방법에 의하여 화학식 2의 화합물 2가 안전하고 경제적으로 제조될 수 있다.The above reactions a and b proceed almost quantitatively, which is economical and has an advantage that it is very safe since it is not necessary to use a compound having a high risk. Therefore, Compound 2 of Formula 2 can be produced safely and economically by the above process.

상기 반응에 의해 화학식 2의 화합물 2가 합성될 경우 라세믹 혼합물로 얻어지게 되므로 광학적으로 순수한 화학식 2의 화합물 2를 얻어야 할 필요성이 있다. 본 발명에서 광학적으로 순수한 화학식 2의 화합물 2를 얻는 방법은 제한되지 않는다. 그 하나의 예로서 상기 화학식 2의 화합물 2를 Hovorka, M. 등(Hovorka, M.; Stibor, I.; Holakovsky, R.; Smiskova, I.; Struzka, V. Czech Rep. (2001), CZ 287879 B6)에 의해 공지된 방법을 응용 및 개선하여 싱코니딘(cinchonidine)으로 분리(resolution)해서 광학적으로 순수한 형태로 제조할 수 있다.When the compound 2 of the formula 2 is synthesized by the above reaction, it is necessary to obtain the optically pure compound 2 of the formula 2 since the compound 2 is obtained as a racemic mixture. Optically method for obtaining Compound (2) of formula (2) pure in the present invention is not limited. As a single example, the compound 2 represented by the above formula 2 Hovorka, M. etc. (Hovorka, M .; Stibor, I .; Holakovsky, R .; Smiskova, I .; Struzka, V. Czech Rep. (2001), CZ 287879 B6) can be applied and improved to produce optically pure form by resolution with cinchonidine.

상기 예시적인 방법을 도식화하면 하기의 반응식 3과 같다.The above exemplary method is schematically shown in the following reaction formula (3).

[반응식 3][Reaction Scheme 3]

2 2a 2b       2 2a 2b

상기와 같이 광학적으로 순수한 화합물 2a ((S) 형) 및 2b ((R) 형)를 분리할 수 있으며 화합물 2a를 사용하여 하기 반응식 4에 따라 반응을 진행하면 목적 화합물 1a (R1=O) 또는 1a (R1=H,H) 를 제조할 수 있다.When moving the optically pure compounds 2a ((S) type) and 2b ((R) type) can be separated, and to the use of compound 2a reaction according to scheme 4 as described above, the desired compound 1a (R 1 = O) Or 1a (R < 1 > = H, H).

[반응식 4][Reaction Scheme 4]

Figure 112013062420563-pat00025
Figure 112013062420563-pat00025

2a 1a (     2a 1a ( RR 1One =O) 1a (= O) 1a ( RR 1One =H,H)= H, H)

상기 반응 c는 상기 반응식 1에서 언급한 바와 같이, 반응을 위한 용매로는 N,N-디메틸포름아미드(DMF), N-메틸-2-피롤리돈(NMP), 디메틸설폭사이드(DMSO), 테트라하이드로퓨란(THF), 디클로로메탄 등을 사용할 수 있으며, DMF가 바람직하다. 상기 반응 c에 사용되는 염기로는 Et3N, NaH, NaOH, 및 C1~C4의 소디움 혹은 포타시움 알콕사이드 등의 유기 또는 무기 염기를 들 수 있으며, NaOH가 바람직하다. 염기의 양은 1~5 당량을 사용하며, 2 당량이 바람직하다. 또한 상기 반응 c는 -40~30 ℃에서 이루어지며, 상온에서 수행하는 것이 바람직하다.The reaction c is performed in the presence of N, N-dimethylformamide (DMF), N-methyl-2-pyrrolidone (NMP), dimethylsulfoxide (DMSO) Tetrahydrofuran (THF), dichloromethane and the like can be used, and DMF is preferable. Examples of the base used in the above reaction c include organic or inorganic bases such as Et 3 N, NaH, NaOH, and C 1 -C 4 sodium or potassium alkoxide, and NaOH is preferable. The amount of the base is 1 to 5 equivalents, preferably 2 equivalents. Also, the reaction c is carried out at -40 to 30 캜, preferably at room temperature.

상기 반응 d에서 반응을 위한 용매로는 테트라하이드로퓨란, 다이옥산, 디클로로메탄, 톨루엔 등을 사용할 수 있으며, 테트라하이드로퓨란이 바람직하다. 상기 반응 d에 사용되는 환원제로는 이 분야에 공지된 것을 제한 없이 사용할 수 있으며, BF3 ·Et2O와 소디움보로하이드라이드를 혼합하여 사용하는 것이 바람직하다.As the solvent for the reaction in the reaction d, tetrahydrofuran, dioxane, dichloromethane, toluene and the like can be used, and tetrahydrofuran is preferable. Examples of the reducing agent used in the reaction d may be used, without limitation, those that are known in the art, it is preferred to use a mixture of hydrides in beam 3 · Et 2 O and sodium BF.

또한 반응식 3에서 얻은 화합물 2b ((R) 형)를 출발 물질로 하여 상기 반응식 4의 방법으로 목적 화합물 1b (R1=O) 또는 1b (R1=H,H) 를 제조할 수 있다.It can also be prepared the desired compound 1b (R 1 = O) or 1b (R 1 = H, H ) Compound 2b ((R) type) obtained in Reaction Scheme 3 by the method of Scheme 4 as a starting material.

본 발명의 화학식 1의 화합물 1, 1a 또는 1b는 이민 결합을 통하여 키랄 아미노 알코올 또는 아미노산의 키랄성을 인식하여 이들을 각각의 광학이성질체로 분리하거나, L-아미노산을 D-아미노산 또는 D-아미노산을 L-아미노산으로 변환시키는데 매우 유용한 하기 화학식 6의 화합물을 제조함에 있어서 중요한 중간체로 사용된다.Compound 1 , 1a or 1b of the present invention recognizes the chiral property of a chiral amino alcohol or an amino acid through imine bonding and separates the chiral amino alcohol or the amino acid into an optical isomer, separates the L-amino acid into a D-amino acid or a D- Is used as an important intermediate in the preparation of a compound of formula (6) which is very useful for conversion to an amino acid.

[화학식 6][Chemical Formula 6]

Figure 112013062420563-pat00026
Figure 112013062420563-pat00027
Figure 112013062420563-pat00028
Figure 112013062420563-pat00026
Figure 112013062420563-pat00027
Figure 112013062420563-pat00028

6 6a 6b    6 6a 6b

이하, 본 발명을 실시예를 이용하여 더욱 상세하게 설명한다. 그러나 하기 실시예는 본 발명을 예시하기 위한 것으로서 본 발명은 하기 실시예에 의해 한정되지 않고 다양하게 수정 및 변경될 수 있다.Hereinafter, the present invention will be described in more detail with reference to examples. However, the following examples are intended to illustrate the present invention, and the present invention is not limited by the following examples, but may be variously modified and changed.

[[ 실시예Example ]]

실시예 1: [(S)-4-(2-(3-(3-p- 톨릴우레이도 ) 벤질옥시 )나프탈렌-1-일)-3-히드록시-2-나프토산]의 제조 (화합물 1a (R1=O)) Example 1: Preparation of [(S) -4- (2- (3- (3-p- tolylido ) benzyloxy ) naphthalen-1-yl) -3- hydroxy-2-naphthoic acid 1a (R < 1 > = O)

상기 반응식 2의 공지된 방법 [M. Noji, M. Nakajima and K. Koga. Tetrahedron Lett. 35 (1994), p. 7983-7984.]을 응용 및 개선하여 제조된 화합물 2를 Hovorka, M. 등(Hovorka, M.; Stibor, I; Holakovsky, R.; Smiskova, I.; Struzka, V. Czech Rep. (2001), CZ 287879 B6)에 의해 공지된 기술을 응용 및 개선하여 싱코니딘으로 분리한 (S)-3-히드록시-4-(2-히드록시나프탈렌-1-일)-2-나프토산(9.0 g, 27 mmol)을 54 mL의 DMF에 용해한 다음 2.2 g의 NaOH를 첨가하고, 1 시간 동안 상온에서 교반하였다. 이 반응 용액에 1-(3-(브로모메틸)페닐)-3-p-톨릴우레아(8.7 g, 27 mmol)를 첨가한 다음, 3 시간 동안 교반하고 물을 부어 생성된 고체를 여과하여 표제 화합물 15.3 g (수율 99 %, 순도 96.5 %)을 얻었다.The known method [M. Noji, M. Nakajima and K. Koga. Tetrahedron Lett. 35 (1994), p. . 7983-7984] for the application and the compound 2 produced by improving Hovorka, M. etc. (Hovorka, M .; Stibor, I ; Holakovsky, R .; Smiskova, I .; Struzka, V. Czech Rep (2001). , CZ 287879 B6), to obtain (S) -3-hydroxy-4- (2-hydroxynaphthalen-1-yl) -2-naphthoic acid g, 27 mmol) was dissolved in 54 mL of DMF, then 2.2 g of NaOH was added, and the mixture was stirred at room temperature for 1 hour. To the reaction solution, 1- (3- (bromomethyl) phenyl) -3-p-tolyl urea (8.7 g, 27 mmol) was added and stirred for 3 hours. Water was poured out, 15.3 g (yield: 99%, purity: 96.5%) of a compound was obtained.

1H NMR(DMSO-d6, 400MHz), δ 8.60 (s, 1H, OH), 7.84(d, 1H, ArH), 7.79 (d, 1H, ArH), 7.73 (d, 1H, ArH), 7.43 (s(br), 1H, OH), 7.33~7.24 (m, 2H, ArH), 7.22~7.17 (m, 4H, ArH), 7.13 (s(br), 1H, NH), 7.08~7.00 (m, 4H, ArH), 6.92~6.88 (m, 3H, ArH), 6.84 (s(br), 1H, NH), 6.61 (d, 1H, ArH), 4.89 (dd, 2H, CH2), 2.16 (s, 3H, CH3). 1 H NMR (DMSO-d 6 , 400MHz), δ 8.60 (s, 1H, OH), 7.84 (d, 1H, ArH), 7.79 (d, 1H, ArH), 7.73 (d, 1H, ArH), 7.43 (br), 1H, OH), 7.33-7.24 (m, 2H, ArH), 7.22-7.17 (m, 4H, ArH), 7.13 (D, 2H, CH 2 ), 2.16 (d, 2H, ArH), 6.92-6.88 (m, 3H, ArH), 6.84 s, 3H, CH 3).

HPLC 분석 조건; 분석 기기-HPLC (Agilent 1200 series) ;컬럼 - CAPCELL PAK UG120 C18 (3.0 x 150mm, Shisheido), 온도 (30 ℃) ; 용매 - 60% 아세토니트릴/H2O (0.1% H3PO4) (6/4, v/v), 유량 : 0.5 mL/min, 검출 파장 : 230nmHPLC analysis conditions; Analytical instrument-HPLC (Agilent 1200 series), column - CAPCELL PAK UG120 C 18 (3.0 x 150 mm, Shisheido), temperature (30 캜); Solvent - 60% acetonitrile / H 2 O (0.1% H 3 PO 4) (6/4, v / v), flow rate: 0.5 mL / min, detection wavelength: 230nm

실시예 2: [(S)-1-(3-((1-(2-히드록시-3-( 히드록실메틸 )나프탈렌-1-일)나프탈렌-2-일옥시)메틸)페닐)-3-p-톨릴우레아]의 제조 (화합물 1a (R1=H,H)) Example 2: Synthesis of [(S) -1- (3 - ((1- (2-hydroxy-3- ( hydoxylmethyl ) naphthalen- 3-p-tolyl urea] (Compound 1a (R 1 = H, H))

실시예 1에서 얻은 (S)-4-(2-(3-(3-p-톨릴우레이도)벤질옥시)나프탈렌-1-일)-3-히드록시-2-나프토산(15.3 g, 27.0 mmol)을 THF (150 mL)에 용해한 후, BF3·Et2O (3.1 g)와 소디움보로하이드라이드 (15 g)를 연속해서 첨가하였다. 이 반응 혼합물을 60 ℃에서 8 시간 동안 교반한 다음, 묽은 염산을 첨가하여 반응을 종결시키고, 에틸아세테이트 (150 mL)와 물 (150 mL)을 가하였다. 유기층을 무수 MgSO4로 건조하고 여과한 후 농축하여 표제 화합물을 얻었다 (14.9 g, 수율: 100 %, 순도 95.5 %).Naphthalen-1-yl) -3-hydroxy-2-naphthoic acid (15.3 g, 27.0 mmol) obtained in Example 1 mmol) was dissolved in THF (150 mL), BF 3揃 Et 2 O (3.1 g) and sodium borohydride (15 g) were added successively. The reaction mixture was stirred at 60 < 0 > C for 8 hours, then diluted hydrochloric acid was added to terminate the reaction, and ethyl acetate (150 mL) and water (150 mL) were added. The organic layer was dried over anhydrous MgSO 4 , filtered, and concentrated to obtain the title compound (14.9 g, yield: 100%, purity 95.5%).

1H NMR (CDCl3, 400 MHz), δ 7.91(d, 1H, ArH), 7.81 (d, 1H, ArH), 7.71 (d, 1H, ArH), 7.68 (s, 1H, ArH), 7.63 (s, 1H, ArH), 7.48 (s, 1H, OH), 7.37 (d, 1H, ArH), 7.34~7.29 (m, 2H, ArH), 7.25~7.12 (m, 5H, ArH), 7.03~6.87 (m, 4H, ArH), 6.61~6.57 (m, 2H, ArH), 6.00 (s, 1H, NH), 5.08 (d, 1H, 1/2CH2OH), 4.91 (d, 1H, 1/2CH2OH), 4.73 (dd, 2H, CH2), 2.25 (s, 3H, CH3). 1 H NMR (CDCl 3, 400 MHz), δ 7.91 (d, 1H, ArH), 7.81 (d, 1H, ArH), 7.71 (d, 1H, ArH), 7.68 (s, 1H, ArH), 7.63 ( 2H, ArH), 7.25-7.12 (m, 5H, ArH), 7.03 ~ 6.87 (s, 1H, ArH) (m, 4H, ArH), 6.61 ~ 6.57 (m, 2H, ArH), 6.00 (s, 1H, NH), 5.08 (d, 1H, 1 / 2CH 2 OH), 4.91 (d, 1H, 1 / 2CH 2 OH), 4.73 (dd, 2H, CH 2), 2.25 (s, 3H, CH 3).

HPLC 분석 조건; 분석 기기-HPLC (Agilent 1200 series) ;컬럼 - CAPCELL PAK UG120 C18 (3.0 x 150mm, Shisheido), 온도 (30 ℃) ; 용매 - 60% 아세토니트릴/H2O (0.1 % H3PO4) (6/4, v/v), 유량 : 0.5 mL/min, 검출 파장 : 230 nmHPLC analysis conditions; Analytical instrument-HPLC (Agilent 1200 series), column - CAPCELL PAK UG120 C 18 (3.0 x 150 mm, Shisheido), temperature (30 캜); Solvent - 60% acetonitrile / H 2 O (0.1% H 3 PO 4) (6/4, v / v), flow rate: 0.5 mL / min, detection wavelength: 230 nm

실시예 3: [(R)-4-(2-(3-(3-p- 톨릴우레이도 ) 벤질옥시 )나프탈렌-1-일)-3-히드록시-2-나프토산]의 제조 (화합물 1b (R1=O)) Example 3: Preparation of [(R) -4- (2- (3- (3-p- tolylido ) benzyloxy ) naphthalen-1-yl) -3- hydroxy-2-naphthoic acid 1b (R < 1 > = O)

(R)-3-히드록시-4-(2-히드록시나프탈렌-1-일)-2-나프토산을 사용하여 상기 실시예 1과 같은 방법으로 표제 화합물을 얻었다.(R) -3-hydroxy-4- (2-hydroxynaphthalen-1-yl) -2-naphthoic acid, the title compound was obtained in the same manner as in the above Example 1.

1H NMR (DMSO-d6, 400 MHz), δ 8.61 (s, 1H, OH), 7.87(d, 1H, ArH), 7.81 (d, 1H, ArH), 7.73 (d, 1H, ArH), 7.37~7.17 (m, 8H, ArH + NH), 7.07~6.89 (m, 9H, ArH + NH), 6.69 (d, 1H, ArH), 4.94 (dd, 2H, CH2), 2.19 (s, 3H, CH3) 1 H NMR (DMSO-d 6 , 400 MHz), δ 8.61 (s, 1H, OH), 7.87 (d, 1H, ArH), 7.81 (d, 1H, ArH), 7.73 (d, 1H, ArH), 7.37 ~ 7.17 (m, 8H, ArH + NH), 7.07 ~ 6.89 (m, 9H, ArH + NH), 6.69 (d, 1H, ArH), 4.94 (dd, 2H, CH 2), 2.19 (s, 3H , CH 3)

실시예 4: [(R)-1-(3-((1-(2-히드록시-3-( 히드록시메틸 )나프탈렌-1-일)나프탈렌-2-일옥시)메틸)페닐)-3-p-톨릴우레아]의 제조 (화합물 1b (R1=H,H)) Example 4: Preparation of [(R) -1- (3 - ((1- (2-hydroxy-3- ( hydroxymethyl ) naphthalen- 3-p-tolyl urea] (Compound 1b (R 1 = H, H))

(R)-4-(2-(3-(3-p-톨릴우레이도)벤질옥시)나프탈렌-1-일)-3-히드록시-2-나프토산을 사용하여 상기 실시예 1과 같은 방법으로 표제 화합물을 얻었다. Naphthalen-1-yl) -3-hydroxy-2-naphthoic acid was used in place of (R) -4- (2- (3- (3- To give the title compound.

1H NMR (CDCl3, 400MHz), δ 7.96 (d, 1H, ArH), 7.85 (d, 1H, ArH), 7.76 (d, 1H, ArH), 7.74 (s, 1H, ArH), 7.59 (s, 1H, ArH), 7.51 (d, 1H, ArH), 7.49 (d, 1H, ArH), 7.44~7.15 (m, 8H, ArH), 7.05~6.96 (m, 4H, ArH), 6.65 (d, 1H, ArH), 6.58 (s, 1H, NH), 5.19 (d, 1H, 1/2CH2OH), 5.01 (d, 1H, 1/2CH2OH), 4.78 (dd, 2H, CH2), 2.26 (s, 3H, CH3) 1 H NMR (CDCl 3, 400MHz ), δ 7.96 (d, 1H, ArH), 7.85 (d, 1H, ArH), 7.76 (d, 1H, ArH), 7.74 (s, 1H, ArH), 7.59 (s , 7.45 (d, 1H, ArH), 7.51 (d, 1H, ArH), 7.49 1H, ArH), 6.58 (s , 1H, NH), 5.19 (d, 1H, 1 / 2CH 2 OH), 5.01 (d, 1H, 1 / 2CH 2 OH), 4.78 (dd, 2H, CH 2), 2.26 (s, 3H, CH 3 )

Claims (5)

하기 화학식 2의 화합물과 하기 화학식 3의 화합물을 염기 존재 하에 유기 용매에서 2-히드록시기의 보호없이 2'-히드록시기에 선택적으로 반응시키는 단계를 포함하는 것을 특징으로 하는 하기 화학식 1의 화합물의 제조 방법:
[화학식 1]
Figure 112016043515458-pat00029

[화학식 2]
Figure 112016043515458-pat00030

[화학식 3]
Figure 112016043515458-pat00031

상기 식에서,
R1은 산소이며;
R2는 -NO2, -NHCX'R3, 또는 -NHS(=O)aR3이며, 상기에서 X'는 산소 또는 황이고, a는 1 또는 2이며, 상기 R3는 수소; 할로겐으로 치환 또는 비치환된 C1~C10의 알킬; -NR4R5; 또는 OR6이고, R4 내지 R6은 각각 독립적으로 수소; 할로겐으로 치환 또는 비치환된 C1~C10의 알킬; 또는 할로겐, 니트로, C1~C5의 알킬기, C1~C5의 알콕시 및 C1~C5의 퍼플루오로알킬기로 이루어진 군으로부터 선택되는 하나 이상의 치환기로 치환 또는 비치환된 C5~C12의 아릴로부터 선택되며;
Z는 할로겐이고;
X 및 Y는 각각 독립적으로 수소; 할로겐; 니트로; 시아노; 할로겐, 시아노, 니트로로 이루어진 군으로부터 선택되는 하나 이상의 치환기로 치환 또는 비치환된 C1~C10의 알킬; C1~C10의 알킬카르보닐; C5~C10의 아릴; 및 C1~C10의 알콕시로 이루어진 군으로부터 선택되며; n 및 m은 0~5의 정수이다.
Which comprises reacting a compound of the formula (2) and a compound of the formula (3): in the presence of a base, with a 2'-hydroxy group without protection of the 2-hydroxy group in an organic solvent.
[Chemical Formula 1]
Figure 112016043515458-pat00029

(2)
Figure 112016043515458-pat00030

(3)
Figure 112016043515458-pat00031

In this formula,
R < 1 > is oxygen;
R 2 is -NO 2 , -NHCX'R 3 , or -NHS (═O) a R 3 , wherein X 'is oxygen or sulfur, a is 1 or 2, and R 3 is hydrogen; C 1 -C 10 alkyl substituted or unsubstituted with halogen; -NR 4 R 5 ; Or OR < 6 > and R < 4 > to R < 6 > are each independently hydrogen; C 1 -C 10 alkyl substituted or unsubstituted with halogen; Or halogen, nitro, C 1 ~ C 5 alkyl group, C 1 ~ C 5 alkoxy and C 1 ~ C 5 with one or more substituents selected from the group consisting of a perfluoroalkyl group-substituted or unsubstituted C 5 ~ C & Lt; / RTI >
Z is halogen;
X and Y are each independently hydrogen; halogen; Nitro; Cyano; C 1 -C 10 alkyl, which is unsubstituted or substituted with one or more substituents selected from the group consisting of halogen, cyano and nitro; C 1 -C 10 alkylcarbonyl; Aryl of C 5 ~ C 10; And C 1 -C 10 alkoxy; n and m are integers of 0 to 5;
제 1 항에 있어서, 염기가 트리에틸아민(TEA) 또는 테트라메틸에틸렌디아민(TMEDA)인 유기 염기, 또는 NaH, NaOH, KOH 및 K2CO3로 이루어진 군으로부터 선택되는 무기 염기인 제조 방법. The process according to claim 1, wherein the base is an organic base in which the base is triethylamine (TEA) or tetramethylethylenediamine (TMEDA), or an inorganic base selected from the group consisting of NaH, NaOH, KOH and K 2 CO 3 . 제 1 항 또는 제 2 항에 있어서, 유기 용매가 N,N-디메틸포름아미드, 디메틸설폭사이드, N-메틸피롤리딘 및 테트라하이드로퓨란으로 이루어진 군으로부터 선택되는 제조 방법.3. The process according to claim 1 or 2, wherein the organic solvent is selected from the group consisting of N, N-dimethylformamide, dimethylsulfoxide, N-methylpyrrolidine and tetrahydrofuran. 제 1 항 또는 제 2 항에 있어서, 화학식 2의 화합물이 하기 화학식 2a로 표시되는 (S) 형 화합물이고, 화학식 1의 화합물이 하기 화학식 1a로 표시되는 (S) 형 화합물인 제조 방법:
[화학식 1a]
Figure 112016043515458-pat00032

[화학식 2a]
Figure 112016043515458-pat00033

상기 식에서, X, Y, n, m, R1 및 R2는 제 1 항에서 정의한 바와 동일하다.
3. The process according to claim 1 or 2, wherein the compound of formula (2) is an (S) -form compound represented by the following formula (2a)
[Formula 1a]
Figure 112016043515458-pat00032

(2a)
Figure 112016043515458-pat00033

Wherein X, Y, n, m, R 1 and R 2 are the same as defined in claim 1 .
제 1 항 또는 제 2 항에 있어서, 화학식 2의 화합물이 하기 화학식 2b로 표시되는 (R) 형 화합물이고, 화학식 1의 화합물이 하기 화학식 1b로 표시되는 (R) 형 화합물인 제조 방법:
[화학식 1b]
Figure 112016043515458-pat00034

[화학식 2b]
Figure 112016043515458-pat00035

상기 식에서, X, Y, n, m, R1 및 R2는 제 1 항에서 정의한 바와 동일하다.
3. The process for producing a compound according to claim 1 or 2, wherein the compound of formula (2) is an (R) -form compound represented by the following formula (2b)
[Chemical Formula 1b]
Figure 112016043515458-pat00034

(2b)
Figure 112016043515458-pat00035

Wherein X, Y, n, m, R 1 and R 2 are the same as defined in claim 1 .
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