+

JP2013055218A - Heat radiator - Google Patents

Heat radiator Download PDF

Info

Publication number
JP2013055218A
JP2013055218A JP2011192443A JP2011192443A JP2013055218A JP 2013055218 A JP2013055218 A JP 2013055218A JP 2011192443 A JP2011192443 A JP 2011192443A JP 2011192443 A JP2011192443 A JP 2011192443A JP 2013055218 A JP2013055218 A JP 2013055218A
Authority
JP
Japan
Prior art keywords
heat
heat dissipation
ceramic body
dissipation device
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011192443A
Other languages
Japanese (ja)
Inventor
Hsiu-Wei Yang
修維 楊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kiko Kagi Kofun Yugenkoshi
Original Assignee
Kiko Kagi Kofun Yugenkoshi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kiko Kagi Kofun Yugenkoshi filed Critical Kiko Kagi Kofun Yugenkoshi
Priority to JP2011192443A priority Critical patent/JP2013055218A/en
Publication of JP2013055218A publication Critical patent/JP2013055218A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Pressure Welding/Diffusion-Bonding (AREA)
  • Cooling Or The Like Of Electrical Apparatus (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent generation of cracks caused by thermal fatigue at a joint between a heat radiator and a heat generation source, for the heat radiator in an electronic apparatus.SOLUTION: A heat radiator 1 comprises a heat radiation member 11 provided with a heat radiation unit 112 such as a heat radiation fin. A heat conduction unit 111 is formed on a face opposite to the heat radiation unit 112 of the heat radiation member 11, and connected with a ceramic main body 12. The heat conduction unit 111 of the heat radiator 1 is joined to a heat generation source via the ceramic main body 12, and thereby thermal fatigue is resolved because their thermal expansion coefficients are substantially equal. The heat radiation member 11 and the ceramic main body 12 are directly joined by a solder joint or the like.

Description

本発明は、放熱装置及びその製造方法に関し、特に、放熱部材とセラミック材料からなる部材とが直接接合されて構成されることにより、放熱装置と発熱源との接合部分に、熱疲労(thermal fatigue)によってクラック(crack)が発生する問題を解決することができる放熱装置及びその製造方法に関する。 The present invention relates to a heat radiating device and a method for manufacturing the same, and in particular, a heat radiating member and a member made of a ceramic material are directly joined to form a thermal fatigue at a joint portion between the heat radiating device and a heat source. The present invention relates to a heat dissipating device and a method for manufacturing the same.

半導体技術の進歩に伴い、集積回路の体積は、徐々に縮小されている。また、集積回路がさらに多くのデータを処理できるようにするために、集積回路には、従来より数倍以上の数の演算素子が積載されるようになっている。しかし、集積回路内の演算素子の数が増加することにより、演算素子が動作するときに発生する熱も多くなる。CPUを例に挙げると、最大稼動中のCPUから発生する熱は、CPU全体を焼損させるのに十分な熱量である。従って、集積回路の放熱装置は、非常に重要である。 With the progress of semiconductor technology, the volume of integrated circuits is gradually reduced. Further, in order to allow the integrated circuit to process a larger amount of data, the integrated circuit is loaded with a number of arithmetic elements several times that of the conventional circuit. However, as the number of arithmetic elements in the integrated circuit increases, more heat is generated when the arithmetic elements operate. Taking the CPU as an example, the heat generated from the CPU in maximum operation is a sufficient amount of heat to burn out the entire CPU. Therefore, the heat dissipation device of the integrated circuit is very important.

電子装置中のCPUユニット及びチップは、発熱源であるため、動作するとき、熱が発生する。CPUユニット及びチップの外部パッケージは、主に、セラミック材料からなる。セラミック材料は、熱膨張係数が低く、絶縁物質である上、熱膨張係数がチップに近いため、パッケージ材料及び半導体材料として大量に使用されている。 Since the CPU unit and the chip in the electronic device are heat generation sources, heat is generated when operating. The external package of the CPU unit and the chip is mainly made of a ceramic material. Ceramic materials have a low thermal expansion coefficient, are insulating materials, and have a thermal expansion coefficient close to that of a chip, so that they are used in large quantities as package materials and semiconductor materials.

放熱装置は、一般に、アルミニウム材料及び銅材料が放熱構造の材料とされる。また、ファン、ヒートパイプなどの放熱部材が組み合わされることにより、放熱効果が増強される。しかし、ファン及びヒートパイプを採用することにより、放熱装置全体の信頼性が低下してしまう。 In general, an aluminum material and a copper material are used as a material for the heat dissipation device. Moreover, the heat radiation effect is enhanced by combining heat radiating members such as a fan and a heat pipe. However, adopting a fan and a heat pipe reduces the reliability of the entire heat dissipation device.

一般に、放熱装置は、全体の構造が簡素であるほど、信頼性が高くなる。また、銅の放熱能力よりも優れた材料を放熱構造の材料とすることにより、熱伝導率を直接改善することができる。 In general, the simpler the overall structure of the heat dissipation device, the higher the reliability. Moreover, the thermal conductivity can be directly improved by using a material having a heat dissipation structure that is superior to the heat dissipation capability of copper.

また、放熱装置と発熱源との間の熱応力の問題は、製品の信頼性に関わるもう1つの問題である。発熱源(例えば、CPU内のチップ)の熱膨張係数は低いため、AlN(窒化アルミニウム)、SiC(炭化ケイ素)などの熱膨張係数が低いセラミック材料によってチップをパッケージすることにより、製品の信頼性を高めている。 The problem of thermal stress between the heat dissipation device and the heat source is another problem related to the reliability of the product. Since the thermal expansion coefficient of a heat source (for example, a chip in a CPU) is low, product reliability is achieved by packaging the chip with a ceramic material having a low thermal expansion coefficient such as AlN (aluminum nitride) or SiC (silicon carbide). Is increasing.

また、例えば、LEDの放熱に関し、アルミニウム材料及び銅材料の熱膨張係数は、サファイヤ(sapphire)よりも遥かに高い。そのため、高輝度LEDを長期間使用した場合、熱疲労により、アルミニウム材料及び銅材料とサファイヤとの接合部分にクラックが発生し、接合面の熱抵抗が上昇してしまう問題が発生しやすい。放熱境界面の熱抵抗が上昇した場合、高輝度LED製品に熱が蓄積することにより、LEDチップが損傷し、発光体が損壊する虞がある。 For example, regarding the heat dissipation of the LED, the thermal expansion coefficient of the aluminum material and the copper material is much higher than that of sapphire. Therefore, when a high-intensity LED is used for a long period of time, due to thermal fatigue, a crack is likely to occur in the joint portion between the aluminum material and the copper material and sapphire, and the thermal resistance of the joint surface is likely to increase. When the thermal resistance at the heat dissipation interface increases, heat accumulates in the high-brightness LED product, which may damage the LED chip and damage the light emitter.

従って、発熱源外部のセラミック材料と金属材料からなる放熱装置との接合部分に、熱膨張係数の相違によって発生する熱疲労により、クラックが発生する問題の早急な解決が求められていた。 Accordingly, there has been a demand for an immediate solution to the problem that cracks are generated due to thermal fatigue caused by the difference in thermal expansion coefficient at the joint portion between the ceramic material outside the heat source and the heat dissipation device made of a metal material.

特開2005−95944号公報JP 2005-95944 A 特開2009−283559号公報JP 2009-283559 A 特表2005−510357号公報JP 2005-510357 A

本発明の主な目的は、放熱装置と発熱源との接合部分に、熱疲労によってクラックが発生する問題を解決することができる放熱装置を提供することにある。
本発明のもう1つの目的は、放熱装置と発熱源との接合部分に、熱疲労によってクラックが発生する問題を解決することができる放熱装置の製造方法を提供することにある。
A main object of the present invention is to provide a heat dissipating device that can solve the problem of cracks caused by thermal fatigue at a joint portion between a heat dissipating device and a heat source.
Another object of the present invention is to provide a method of manufacturing a heat dissipation device that can solve the problem of cracks caused by thermal fatigue at the joint between the heat dissipation device and a heat source.

上述の課題を解決するために、本発明の放熱装置は、放熱部材を具える。 In order to solve the above-described problems, the heat dissipation device of the present invention includes a heat dissipation member.

放熱部材は、半導体装置などの発熱源に対する導熱部を有する。放熱部材の導熱部と反対側の面は、放熱フィンなどの放熱部を有する。導熱部には、発熱源に直接接合して熱を伝導するセラミック本体が接続される。 The heat radiating member has a heat conducting portion for a heat source such as a semiconductor device. A surface of the heat radiating member opposite to the heat conducting portion has a heat radiating portion such as a heat radiating fin. A ceramic body that conducts heat by joining directly to a heat source is connected to the heat conducting portion.

放熱部材は、フィンを具えた放熱器、板型ヒートパイプ、ヒートパイプ又はウォータブロックである。 The heat radiating member is a heat radiator, a plate heat pipe, a heat pipe or a water block having fins.

セラミック本体の材料は、窒化ケイ素(Si)、酸化ジルコニウム(ZrO)又は酸化アルミニウム(Al)である。 The material of the ceramic body is silicon nitride (Si 3 N 4 ), zirconium oxide (ZrO 2 ) or aluminum oxide (Al 2 O 3 ).

上述の課題を解決するために、本発明の放熱装置の製造方法は、以下のステップを含む。 In order to solve the above-described problem, a method for manufacturing a heat dissipation device of the present invention includes the following steps.

放熱フィンなどの放熱部及びその反対側の面に半導体装置などの発熱源に相対する導熱部を形成した放熱部材及び発熱源に直接接合されて熱を伝導するセラミック本体を準備する。 A heat dissipating part such as a heat dissipating fin and a heat dissipating member having a heat conducting part opposite to a heat generating source such as a semiconductor device formed on a surface opposite to the heat dissipating part and a ceramic body that is directly bonded to the heat generating source and conducts heat are prepared.

放熱部材とセラミック本体とを接合する。 The heat dissipating member and the ceramic body are joined.

放熱部材とセラミック本体との接合は、軟質はんだ接合、硬質はんだ接合、拡散接合、超音波溶接又は銅直接接合(Direct Bonding Copper:DBC)によって行われる。 The heat radiating member and the ceramic body are joined by soft solder joining, hard solder joining, diffusion joining, ultrasonic welding, or direct bonding copper (DBC).

本発明の放熱装置は、セラミック本体と放熱部材とが直接接合されて構成される。使用される際、セラミック本体と発熱源外部のセラミック外表面とが接合されることにより、放熱装置と発熱源との接合部分に、熱膨張係数の相違によって発生する熱疲労により、クラックが発生する問題を解決することができる。 The heat dissipation device of the present invention is configured by directly joining a ceramic body and a heat dissipation member. When used, the ceramic body and the ceramic outer surface outside the heat source are joined, so that cracks occur due to thermal fatigue caused by the difference in thermal expansion coefficient at the joint between the heat dissipation device and the heat source. The problem can be solved.

本発明の第1実施形態による放熱装置を示す分解斜視図である。1 is an exploded perspective view showing a heat dissipation device according to a first embodiment of the present invention. 本発明の第1実施形態による放熱装置を示す斜視図である。1 is a perspective view showing a heat dissipation device according to a first embodiment of the present invention. 本発明の第1実施形態による放熱装置を示す側面図である。It is a side view which shows the thermal radiation apparatus by 1st Embodiment of this invention. 本発明の第2実施形態による放熱装置を示す分解斜視図である。It is a disassembled perspective view which shows the thermal radiation apparatus by 2nd Embodiment of this invention. 本発明の第2実施形態による放熱装置を示す斜視図である。It is a perspective view which shows the thermal radiation apparatus by 2nd Embodiment of this invention. 本発明の第3実施形態による放熱装置を示す断面図である。It is sectional drawing which shows the thermal radiation apparatus by 3rd Embodiment of this invention. 本発明の第4実施形態による放熱装置を示す分解斜視図である。It is a disassembled perspective view which shows the thermal radiation apparatus by 4th Embodiment of this invention. 本発明の第4実施形態による放熱装置を示す斜視図である。It is a perspective view which shows the thermal radiation apparatus by 4th Embodiment of this invention. 本発明の一実施形態による放熱装置の製造方法を示すフロー図である。It is a flowchart which shows the manufacturing method of the thermal radiation apparatus by one Embodiment of this invention.

本発明の目的、特徴および効果を示す実施形態を図面に沿って詳細に説明する。 DESCRIPTION OF EMBODIMENTS Embodiments showing the objects, features, and effects of the present invention will be described in detail with reference to the drawings.

(第1実施形態)
図1〜図3を参照する。図1は、本発明の第1実施形態による放熱装置を示す分解斜視図である。図2は、本発明の第1実施形態による放熱装置を示す斜視図である。図3は、本発明の第1実施形態による放熱装置を示す側面図である。図1〜図3に示すように、本発明の第1実施形態による放熱装置1は、放熱部材11を具える。
(First embodiment)
Please refer to FIG. FIG. 1 is an exploded perspective view showing a heat dissipation device according to a first embodiment of the present invention. FIG. 2 is a perspective view showing the heat dissipation device according to the first embodiment of the present invention. FIG. 3 is a side view showing the heat dissipation device according to the first embodiment of the present invention. As shown in FIGS. 1 to 3, the heat dissipation device 1 according to the first embodiment of the present invention includes a heat dissipation member 11.

放熱部材11は、導熱部111を有する。放熱部材11の導熱部111と反対側の側面は、放熱部112を有する。導熱部111には、セラミック本体12が接続される。本実施形態中、放熱部材11は、放熱器である。また、セラミック本体12の材料は、窒化ケイ素、酸化ジルコニウム又は酸化アルミニウムである。 The heat radiating member 11 has a heat conducting portion 111. A side surface of the heat radiating member 11 opposite to the heat conducting portion 111 has a heat radiating portion 112. The ceramic body 12 is connected to the heat conducting part 111. In this embodiment, the heat radiating member 11 is a heat radiator. The material of the ceramic body 12 is silicon nitride, zirconium oxide or aluminum oxide.

(第2実施形態)
図4及び図5を参照する。図4は、本発明の第2実施形態による放熱装置を示す分解斜視図である。図5は、本発明の第2実施形態による放熱装置を示す斜視図である。図4及び図5に示すように、本発明の第2実施形態による放熱装置は、第1実施形態による放熱装置と一部構造及び接続関係が同一であるため、同一部分は、ここでは繰り返して述べない。本発明の第2実施形態による放熱装置は、放熱部材11が板型ヒートパイプである点が第1実施形態と異なる。セラミック本体12は、放熱部材11の導熱部111に接合される。
(Second Embodiment)
Please refer to FIG. 4 and FIG. FIG. 4 is an exploded perspective view showing a heat dissipation device according to the second embodiment of the present invention. FIG. 5 is a perspective view showing a heat dissipation device according to the second embodiment of the present invention. As shown in FIGS. 4 and 5, the heat dissipation device according to the second embodiment of the present invention has the same structure and connection relationship as the heat dissipation device according to the first embodiment. I don't mention. The heat dissipation device according to the second embodiment of the present invention is different from the first embodiment in that the heat dissipation member 11 is a plate heat pipe. The ceramic body 12 is joined to the heat conducting part 111 of the heat radiating member 11.

(第3実施形態)
図6を参照する。図6は、本発明の第3実施形態による放熱装置を示す断面図である。図6に示すように、本発明の第3実施形態による放熱装置は、第1実施形態による放熱装置と一部構造及び接続関係が同一であるため、同一部分は、ここでは繰り返して述べない。本発明の第3実施形態による放熱装置は、放熱部材11がヒートパイプである点が第1実施形態と異なる。セラミック本体12には、放熱部材11の導熱部111が接合される。
(Third embodiment)
Please refer to FIG. FIG. 6 is a cross-sectional view illustrating a heat dissipation device according to a third embodiment of the present invention. As shown in FIG. 6, the heat dissipating device according to the third embodiment of the present invention has the same structure and connection as the heat dissipating device according to the first embodiment. Therefore, the same parts will not be described again here. The heat dissipation device according to the third embodiment of the present invention is different from the first embodiment in that the heat dissipation member 11 is a heat pipe. A heat conducting portion 111 of the heat radiating member 11 is joined to the ceramic body 12.

(第4実施形態)
図7及び図8を参照する。図7は、本発明の第4実施形態による放熱装置を示す分解斜視図である。図8は、本発明の第4実施形態による放熱装置を示す斜視図である。図7及び図8に示すように、本発明の第4実施形態による放熱装置は、第1実施形態による放熱装置と一部構造及び接続関係が同一であるため、同一部分は、ここでは繰り返して述べない。本発明の第4実施形態による放熱装置は、放熱部材11がウォータブロックである点が第1実施形態と異なる。セラミック本体12は、放熱部材11の導熱部111に接合される。
(Fourth embodiment)
Please refer to FIG. 7 and FIG. FIG. 7 is an exploded perspective view showing a heat dissipation device according to the fourth embodiment of the present invention. FIG. 8 is a perspective view showing a heat dissipation device according to the fourth embodiment of the present invention. As shown in FIGS. 7 and 8, the heat dissipation device according to the fourth embodiment of the present invention has the same structure and connection relationship as the heat dissipation device according to the first embodiment. I don't mention. The heat radiating device according to the fourth embodiment of the present invention is different from the first embodiment in that the heat radiating member 11 is a water block. The ceramic body 12 is joined to the heat conducting part 111 of the heat radiating member 11.

図9を参照する。図9は、本発明の一実施形態による放熱装置の製造方法を示すフロー図である。図1〜図8を合わせて参照する。本発明の一実施形態による放熱装置の製造方法は、以下のステップからなる。   Please refer to FIG. FIG. 9 is a flowchart showing a method for manufacturing a heat dissipation device according to an embodiment of the present invention. Please refer to FIGS. The manufacturing method of the heat radiating device by one Embodiment of this invention consists of the following steps.

S1:放熱部材及びセラミック本体を準備する。 S1: Prepare a heat dissipation member and a ceramic body.

S1において、放熱部材11及びセラミック本体12を準備する。放熱部材11は、放熱器、板型ヒートパイプ、ヒートパイプ又はウォータブロックである。セラミック本体12の材料は、窒化ケイ素、酸化ジルコニウム又は酸化アルミニウムである。 In S1, the heat radiating member 11 and the ceramic main body 12 are prepared. The heat radiating member 11 is a heat radiator, a plate-type heat pipe, a heat pipe, or a water block. The material of the ceramic body 12 is silicon nitride, zirconium oxide or aluminum oxide.

S2:放熱部材とセラミック本体とを接合する。 S2: Join the heat dissipation member and the ceramic body.

S2において、放熱部材11の導熱部111とセラミック本体12とを接合する。放熱部材11とセラミック本体12との接合は、軟質はんだ接合、硬質はんだ接合、拡散接合、超音波溶接又は銅直接接合によって行われる。 In S <b> 2, the heat conducting part 111 of the heat radiating member 11 and the ceramic body 12 are joined. The heat radiating member 11 and the ceramic body 12 are joined by soft solder joining, hard solder joining, diffusion joining, ultrasonic welding, or copper direct joining.

本発明の放熱装置は、放熱部材11(例えば、放熱器、板型ヒートパイプ、ヒートパイプ、ウォータブロックなど)と発熱源との間にセラミック本体12が接合されて構成される。セラミック本体12の熱膨張係数は、発熱源の外部に封止されたセラミックパッケージの熱膨張係数に近いため、放熱装置11と発熱源との接合部分に、熱膨張係数の相違によって発生する熱疲労により、クラックが発生する問題を解決することができ、放熱部材の適用範囲を広げることができる。 The heat radiating device of the present invention is configured by joining a ceramic body 12 between a heat radiating member 11 (for example, a heat radiator, a plate heat pipe, a heat pipe, a water block, etc.) and a heat source. Since the thermal expansion coefficient of the ceramic body 12 is close to the thermal expansion coefficient of the ceramic package sealed outside the heat generation source, thermal fatigue that occurs due to the difference in thermal expansion coefficient at the joint between the heat dissipation device 11 and the heat generation source. Thus, the problem of cracking can be solved, and the application range of the heat dissipation member can be expanded.

1 放熱装置
11 放熱部材
111 導熱部
112 放熱部
12 セラミック本体
1 Heat Dissipation Device 11 Heat Dissipation Member 111 Heat Conducting Portion 112 Heat Dissipation Portion 12 Ceramic Body

Claims (10)

放熱部材を備える放熱装置であって、
前記放熱部材は、発熱源に対する導熱部を有し、前記放熱部材の前記導熱部と反対側の面は、放熱部を有し、前記導熱部には発熱源に直接接するセラミック本体が接続されることを特徴とする放熱装置。
A heat dissipation device including a heat dissipation member,
The heat dissipating member has a heat conducting part for a heat source, the surface of the heat dissipating member opposite to the heat conducting part has a heat dissipating part, and a ceramic body that is in direct contact with the heat source is connected to the heat conducting part. A heat dissipation device characterized by that.
前記放熱部材は、放熱器、板型ヒートパイプ、ヒートパイプ又はウォータブロックであることを特徴とする請求項1に記載の放熱装置。 The heat radiating device according to claim 1, wherein the heat radiating member is a heat radiator, a plate heat pipe, a heat pipe, or a water block. 前記セラミック本体の材料は、窒化ケイ素(Si)、酸化ジルコニウム(ZrO)又は酸化アルミニウム(Al)であることを特徴とする請求項1に記載の放熱装置。 The heat dissipation device according to claim 1, wherein the material of the ceramic body is silicon nitride (Si 3 N 4 ), zirconium oxide (ZrO 2 ), or aluminum oxide (Al 2 O 3 ). 前記放熱部材と前記セラミック本体との接合は、軟質はんだ接合、硬質はんだ接合、拡散接合、超音波溶接又は銅直接接合(Direct Bonding Copper:DBC)によって接合されることを特徴とする請求項1に記載の放熱装置。 2. The bonding of the heat radiating member and the ceramic body is performed by soft solder bonding, hard solder bonding, diffusion bonding, ultrasonic welding, or direct bonding copper (DBC). The heat dissipation device described. 放熱部及び放熱部の反対面に発熱源に対する導熱部を設けた放熱部材、及び発熱源に直接接してその熱を伝導するセラミック本体を準備するステップと、
前記放熱部材と前記セラミック本体とを接合するステップと、を含むことを特徴とする放熱装置の製造方法。
Preparing a heat dissipating member and a heat dissipating member provided with a heat conducting part for a heat generating source on the opposite surface of the heat dissipating part, and a ceramic body that directly contacts the heat generating source and conducts the heat;
Joining the said heat radiating member and the said ceramic main body, The manufacturing method of the heat radiating device characterized by the above-mentioned.
前記放熱部材と前記セラミック本体との接合は、軟質はんだ接合、硬質はんだ接合又は超音波溶接によって行われることを特徴とする請求項5に記載の放熱装置の製造方法。 The method of manufacturing a heat dissipation device according to claim 5, wherein the heat dissipation member and the ceramic body are joined by soft solder joining, hard solder joining, or ultrasonic welding. 前記放熱部材と前記セラミック本体との接合は、拡散接合によって行われることを特徴とする請求項5に記載の放熱装置の製造方法。 The method for manufacturing a heat dissipation device according to claim 5, wherein the heat dissipation member and the ceramic body are joined by diffusion bonding. 前記セラミック本体の材料は、窒化ケイ素(Si)、酸化ジルコニウム(ZrO)又は酸化アルミニウム(Al)であることを特徴とする請求項5に記載の放熱装置の製造方法。 6. The method of manufacturing a heat dissipation device according to claim 5, wherein the material of the ceramic body is silicon nitride (Si 3 N 4 ), zirconium oxide (ZrO 2 ), or aluminum oxide (Al 2 O 3 ). 前記放熱部材と前記セラミック本体との接合は、銅直接接合(Direct Bonding Copper:DBC)によって行われることを特徴とする請求項5に記載の放熱装置の製造方法。 The method of manufacturing a heat dissipation device according to claim 5, wherein the heat dissipation member and the ceramic body are joined by direct bonding copper (DBC). 前記放熱部材は、放熱器、板型ヒートパイプ、ヒートパイプ又はウォータブロックであることを特徴とする請求項5に記載の放熱装置の製造方法。 6. The method of manufacturing a heat radiating device according to claim 5, wherein the heat radiating member is a heat radiator, a plate heat pipe, a heat pipe, or a water block.
JP2011192443A 2011-09-05 2011-09-05 Heat radiator Pending JP2013055218A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011192443A JP2013055218A (en) 2011-09-05 2011-09-05 Heat radiator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011192443A JP2013055218A (en) 2011-09-05 2011-09-05 Heat radiator

Publications (1)

Publication Number Publication Date
JP2013055218A true JP2013055218A (en) 2013-03-21

Family

ID=48131938

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011192443A Pending JP2013055218A (en) 2011-09-05 2011-09-05 Heat radiator

Country Status (1)

Country Link
JP (1) JP2013055218A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160001373U (en) * 2016-03-18 2016-04-28 제엠제코(주) Clip structure for semiconductor package and semiconductor package including the same
CN106563861A (en) * 2016-10-19 2017-04-19 哈尔滨工业大学(威海) Ultrasonic soldering method for fast forming ceramic-metal interconnection
KR20180028272A (en) * 2016-09-08 2018-03-16 엘지이노텍 주식회사 Heat sink
US9991434B2 (en) 2014-12-25 2018-06-05 Nichia Corporation Semiconductor device with metal-bonded heat dissipator and manufacturing method for the same
CN108356375A (en) * 2018-02-12 2018-08-03 无锡格林沃科技有限公司 It is brazed integral type tablet superconduction cooler and its production technology
US11538733B2 (en) 2019-07-10 2022-12-27 Denso Corporation Electronic device
US11849566B2 (en) 2020-10-29 2023-12-19 Denso Corporation Joint structure, electronic device and method for manufacturing the joint structure

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05102361A (en) * 1991-08-12 1993-04-23 Nec Corp Cooling structure for semiconductor device
JP2008021780A (en) * 2006-07-12 2008-01-31 Mitsubishi Materials Corp Power element mounting unit and power module
JP2008172197A (en) * 2007-10-22 2008-07-24 Dowa Holdings Co Ltd Combined member of aluminum-ceramics
JP2008270296A (en) * 2007-04-16 2008-11-06 Sumitomo Electric Ind Ltd Semiconductor device
JP2010522974A (en) * 2007-03-30 2010-07-08 エレクトロヴァック エージー Heat sink and component or module unit with heat sink

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05102361A (en) * 1991-08-12 1993-04-23 Nec Corp Cooling structure for semiconductor device
JP2008021780A (en) * 2006-07-12 2008-01-31 Mitsubishi Materials Corp Power element mounting unit and power module
JP2010522974A (en) * 2007-03-30 2010-07-08 エレクトロヴァック エージー Heat sink and component or module unit with heat sink
JP2008270296A (en) * 2007-04-16 2008-11-06 Sumitomo Electric Ind Ltd Semiconductor device
JP2008172197A (en) * 2007-10-22 2008-07-24 Dowa Holdings Co Ltd Combined member of aluminum-ceramics

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9991434B2 (en) 2014-12-25 2018-06-05 Nichia Corporation Semiconductor device with metal-bonded heat dissipator and manufacturing method for the same
KR20160001373U (en) * 2016-03-18 2016-04-28 제엠제코(주) Clip structure for semiconductor package and semiconductor package including the same
KR200482370Y1 (en) * 2016-03-18 2017-02-02 제엠제코(주) Clip structure for semiconductor package and semiconductor package including the same
KR20180028272A (en) * 2016-09-08 2018-03-16 엘지이노텍 주식회사 Heat sink
KR102569039B1 (en) 2016-09-08 2023-08-23 엘지이노텍 주식회사 Heat sink
CN106563861A (en) * 2016-10-19 2017-04-19 哈尔滨工业大学(威海) Ultrasonic soldering method for fast forming ceramic-metal interconnection
CN108356375A (en) * 2018-02-12 2018-08-03 无锡格林沃科技有限公司 It is brazed integral type tablet superconduction cooler and its production technology
CN108356375B (en) * 2018-02-12 2024-01-30 无锡格林沃科技有限公司 Brazing integrated flat superconducting cooler and production process thereof
US11538733B2 (en) 2019-07-10 2022-12-27 Denso Corporation Electronic device
US11849566B2 (en) 2020-10-29 2023-12-19 Denso Corporation Joint structure, electronic device and method for manufacturing the joint structure

Similar Documents

Publication Publication Date Title
TWI465678B (en) Temperature uniform plate structure and manufacturing method thereof
CN102956583B (en) Vapor structure and manufacturing method thereof
JP2013055218A (en) Heat radiator
TWI709205B (en) Semiconductor device
US20190271510A1 (en) Manufacturing method of vapor chamber
JP4989552B2 (en) Electronic components
JP2010219524A (en) Millichannel substrate, cooling device using the same, and method of manufacturing device
JPWO2015029511A1 (en) Semiconductor device and manufacturing method thereof
JP2008028352A (en) Electronic device and manufacturing method thereof
WO2017051794A1 (en) Light-emission module having cooler and production method for light-emission module having cooler
JP5939754B2 (en) Structure of plate heat pipe
JP2008187101A (en) Semiconductor device and mounting structure of semiconductor device
US11765861B2 (en) Vapor chamber structure
JP2015090965A (en) Semiconductor device
JP2009176839A (en) Heat dissipation structure of semiconductor element
JP4148123B2 (en) Radiator and power module
JP2013165117A (en) Semiconductor device
TWI541488B (en) Heat dissipation device and method of manufacturing same
JP2009070907A (en) Semiconductor device
JP2009059821A (en) Semiconductor device
JP6565735B2 (en) Power module substrate, power module, and method of manufacturing power module substrate
JP2006269966A (en) Wiring substrate and its manufacturing method
WO2019205535A1 (en) Heat dissipation structure and implementation method therefor, and heat dissipation device
CN202282342U (en) heat sink
JP6422726B2 (en) Heat sink with circuit board and manufacturing method thereof

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20121221

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20121221

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20131217

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20131227

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140108

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20140513

点击 这是indexloc提供的php浏览器服务,不要输入任何密码和下载