CN100395363C - Tungsten-rhenium alloy rod for ion source of ion implanter and preparation method thereof - Google Patents
Tungsten-rhenium alloy rod for ion source of ion implanter and preparation method thereof Download PDFInfo
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Abstract
本发明公开了一种离子注入机离子源用钨铼合金杆及其制备方法,钨铼合金杆由互锁结构伸长晶粒的组成,晶粒的长宽比值大于10,其成份含量:铼:0.2%~0.9wt.%,它还含有掺杂剂,余量为钨。由于在钨中加入一定含量的铼,它克服了传统钨杆的缺点,兼具高熔点,高强度,高硬度,高电阻率,高的再结晶温度等特点,尤其是较低的电子逸出功,其作为离子源灯丝,提高了离子发射强度。
The invention discloses a tungsten-rhenium alloy rod for an ion source of an ion implanter and a preparation method thereof. The tungsten-rhenium alloy rod is composed of elongated crystal grains with an interlocking structure, the aspect ratio of the crystal grains is greater than 10, and its composition content is: rhenium : 0.2%~0.9wt.%, it also contains dopant, and the balance is tungsten. Because a certain amount of rhenium is added to tungsten, it overcomes the shortcomings of traditional tungsten rods, and has the characteristics of high melting point, high strength, high hardness, high resistivity, high recrystallization temperature, etc., especially low electron escape Work, which acts as an ion source filament, increases the intensity of ion emission.
Description
技术领域 technical field
本发明涉及一种离子注入机离子源用钨材料及其制备方法。The invention relates to a tungsten material for an ion source of an ion implanter and a preparation method thereof.
背景技术 Background technique
离子注入技术是近30年来国际上蓬勃发展和广泛应用的一种材料表面改性高新技术。其基本原理是:用能量为100keV量级的离子束入射到材料中去,离子束与材料中的原子或分子将发生一系列物理的和化学的相互作用,入射离子逐渐损失能量,最后停留在材料中,并引起材料表面成分、结构和性能发生变生,从而优化材料表面性能,或获得某些新的优异性能。作为一种材料表面工程技术,离子注入技术具有以下一些其它常规表面处理技术难以达到的独特优点:(1)它是一种纯净的无公害的表面处理技术;(2)无需热激活,无需在高温环境下进行,因而不会改变工件的外形尺寸和表面光洁度;(3)离子注入层由离子束与基体表面发生一系列物理和化学相互作用面形成的一个新表面层,它与基体之间不存在剥落问题;(4)离子注入后无需再进行机械加工和热处理。Ion implantation technology is a high-tech material surface modification technology that has been vigorously developed and widely used internationally in the past 30 years. The basic principle is: use an ion beam with an energy of 100keV to enter the material, a series of physical and chemical interactions will occur between the ion beam and the atoms or molecules in the material, the incident ions will gradually lose energy, and finally stay in the In the material, and cause the surface composition, structure and performance of the material to change, so as to optimize the surface performance of the material, or obtain some new excellent performance. As a material surface engineering technology, ion implantation technology has the following unique advantages that are difficult to achieve by other conventional surface treatment technologies: (1) It is a pure and pollution-free surface treatment technology; It is carried out in a high temperature environment, so it will not change the dimensions and surface finish of the workpiece; (3) The ion implantation layer is a new surface layer formed by a series of physical and chemical interactions between the ion beam and the surface of the substrate. There is no peeling problem; (4) No need for mechanical processing and heat treatment after ion implantation.
离子注入是在离子注入机上实现的。离子注入机一般由以下几个主要部分组成:(1)离子源,用于产生和引出某种元素的离子束,这是离子注入机的源头;(2)加速器;(3)离子束的质量分析;(4)离子束的约束与控制;(5)靶室;(6)真空系统。Ion implantation is performed on an ion implanter. An ion implanter generally consists of the following main parts: (1) ion source, which is used to generate and extract an ion beam of a certain element, which is the source of the ion implanter; (2) accelerator; (3) the quality of the ion beam Analysis; (4) Confinement and control of ion beam; (5) Target chamber; (6) Vacuum system.
其中离子源是离子注入机的“心脏”,现有的离子注入机所用的灯丝材料一般为纯钨杆、掺杂钨杆、以及添加氧化钍的特种合金钨杆。钨杆表面的电子逸出功较高,不利于发射电子;随着人们环保意识的加强,钍钨杆的应用越来越受到限制。Among them, the ion source is the "heart" of the ion implanter. The filament materials used in the existing ion implanter are generally pure tungsten rods, doped tungsten rods, and special alloy tungsten rods added with thorium oxide. The high work function of electrons on the surface of tungsten rods is not conducive to the emission of electrons; with the strengthening of people's awareness of environmental protection, the application of thoriated tungsten rods is becoming more and more restricted.
发明内容 Contents of the invention
本发明的目的在于克服现有技术之不足,提供一种用作离子注入机离子源灯丝的离子注入机离子源用钨铼合金杆及其制备方法。The purpose of the present invention is to overcome the deficiencies of the prior art, and provide a tungsten-rhenium alloy rod for ion implanter ion source used as ion implanter ion source filament and its preparation method.
本发明解决其技术问题所采用的技术方案是:一种离子注入机离子源用钨铼合金杆,由互锁伸长结构的晶粒组成,晶粒的长宽比值大于10,其成份含量:钨:≥99.1wt.%,铼:0.2%~0.9wt.%,它还含有掺杂剂。The technical solution adopted by the present invention to solve the technical problem is: a tungsten-rhenium alloy rod for the ion source of an ion implanter, which is composed of grains of interlocking elongated structure, the aspect ratio of the grains is greater than 10, and its composition content: Tungsten: ≥99.1wt.%, Rhenium: 0.2% to 0.9wt.%, which also contains dopants.
所述的掺杂剂,包括钾,其钾的含量为60~100PPm。The dopant includes potassium, and its potassium content is 60-100PPm.
所述的掺杂剂,包括硅,其硅的含量为5~10PPm。The dopant includes silicon, and the content of silicon is 5-10PPm.
所述的掺杂剂,包括铝,其铝的含量为5~15PPm。The dopant includes aluminum, and the content of aluminum is 5-15PPm.
本发明一种离子注入机离子源用钨铼合金杆的制备方法,它包括如下步骤:A kind of preparation method of the tungsten-rhenium alloy rod for the ion source of the ion implanter of the present invention, it comprises the following steps:
a.原料:以浸泡方式在蓝钨中掺杂钾、硅、铝,以高铼酸铵溶液的形式加入铼,经搅拌、蒸发、干燥得到备用粉末;a. Raw materials: Doping potassium, silicon and aluminum in blue tungsten by soaking, adding rhenium in the form of ammonium perrhenate solution, stirring, evaporating and drying to obtain a spare powder;
b.压型:将备用粉末压制成型;b. Molding: press the spare powder into shape;
c.预烧结:粉末经压型,在1000~1400℃氢气气氛中预烧结,预烧结时间为0.3~1小时;c. Pre-sintering: The powder is pressed and pre-sintered in a hydrogen atmosphere at 1000-1400 ° C. The pre-sintering time is 0.3-1 hour;
d.烧结:经预烧结后的坯条在2600~3000℃温度和氢气保护下高温垂熔烧结,垂熔烧结时间为1~2小时;d. Sintering: The pre-sintered billet is sintered at a temperature of 2600-3000°C under the protection of hydrogen, and the vertical melting sintering time is 1-2 hours;
e.开坯:将粗的坯条逐渐加工至可以拉拔的尺寸;e. Billet opening: gradually process the thick billet to the size that can be drawn;
f.拉丝:将经过开坯的垂熔条锻轧、拉拔得到掺杂钨铼合金杆。f. Wire drawing: Forging, rolling and drawing the blanked vertical melting rod to obtain a doped tungsten-rhenium alloy rod.
g.成型:将上述的钨铼合金杆矫直、切割成所需尺寸。g. Forming: Straighten and cut the above-mentioned tungsten-rhenium alloy rod into required size.
本发明的有益效果是,由于在钨中加入一定含量的铼,它克服了传统钨杆的缺点,兼具高熔点,高强度,高硬度,高电阻率,高的再结晶温度等特点,尤其是较低的电子逸出功,其作为离子源灯丝,提高了离子发射强度。The beneficial effect of the present invention is that due to the addition of a certain amount of rhenium in tungsten, it overcomes the shortcomings of traditional tungsten rods, and has the characteristics of high melting point, high strength, high hardness, high resistivity, high recrystallization temperature, etc., especially Is the lower electron work function, which acts as an ion source filament, increasing the ion emission intensity.
附图说明: Description of drawings:
图1为本发明离子注入机离子源用钨铼合金杆的制备方法的流程图;Fig. 1 is the flow chart of the preparation method of tungsten-rhenium alloy rod for ion implanter ion source of the present invention;
图2为本发明实施例一钨铼合金的金相组织图;Fig. 2 is the metallographic structure diagram of the embodiment of the present invention one tungsten-rhenium alloy;
图3为本发明实施例二钨铼合金的金相组织图;Fig. 3 is the metallographic structure diagram of the ditungsten-rhenium alloy of the embodiment of the present invention;
图4为本发明实施例三钨铼合金的金相组织图;Fig. 4 is the metallographic structure diagram of the tritungsten-rhenium alloy of the embodiment of the present invention;
具体实施方式 Detailed ways
以下结合实施例对本发明作进一步详细说明;但本发明一种离子注入机离子源用钨铼丝的制备方法不局限于实施例。The present invention will be further described in detail below in conjunction with the examples; however, the preparation method of the tungsten-rhenium wire for the ion source of the ion implanter of the present invention is not limited to the examples.
实施例一,本发明为一种离子注入机离子源用钨铼杆的制备方法,它包括如下步骤,如图1所示:Embodiment 1, the present invention is a kind of preparation method of tungsten-rhenium rod for ion source of ion implanter, it comprises the following steps, as shown in Figure 1:
a.原料:以浸泡方式在蓝钨中掺杂钾、硅、铝,以高铼酸铵溶液的形式加入铼,经搅拌、蒸发、干燥,还原得到钨铼合金粉末;a. Raw materials: dope potassium, silicon and aluminum in blue tungsten by soaking, add rhenium in the form of ammonium perrhenate solution, stir, evaporate, dry, and reduce to obtain tungsten-rhenium alloy powder;
b.压型:将钨铼合金粉末压制成型;b. Molding: pressing tungsten-rhenium alloy powder into shape;
c.预烧结:粉末经压型,在1000~1100℃氢气中预烧结,预烧结时间为0.5小时;c. Pre-sintering: The powder is pressed and pre-sintered in hydrogen at 1000-1100 °C, and the pre-sintering time is 0.5 hours;
d.烧结:经预烧结后的坯条在2600~2700℃温度和氢气保护下高温垂熔烧结,垂熔烧结时间为1.2小时;d. Sintering: The pre-sintered billet is sintered at a temperature of 2600-2700°C under the protection of hydrogen, and the vertical melting sintering time is 1.2 hours;
e.开坯:将粗的坯条逐渐加工至可以拉拔的尺寸;e. Billet opening: gradually process the thick billet to the size that can be drawn;
f.拉丝:将经过开坯的垂熔条锻轧、拉拔得到掺杂钨铼合金杆,其成份及含量:铼:0.3wt.%钾:60PPm,硅:5PPm,铝:5PPm,余量为钨。f. Wire drawing: Forge, roll and draw the vertically molten bar that has been billeted to obtain a doped tungsten-rhenium alloy rod. The composition and content: rhenium: 0.3wt.% potassium: 60PPm, silicon: 5PPm, aluminum: 5PPm, the balance for tungsten.
g.成型:将上述的钨铼合金杆矫直、切割成所需尺寸。g. Forming: Straighten and cut the above-mentioned tungsten-rhenium alloy rod into required size.
经过上述七步工序后,即可得到钨铼合金杆,其晶粒宽度比大于10,下垂值1.2,其高温金相组织如图2所示,将钨铼合金杆制成灯丝,即可用于离子注入机其离子源上。After the above seven-step process, a tungsten-rhenium alloy rod can be obtained. The grain width ratio is greater than 10, and the sag value is 1.2. The ion implanter with its ion source on.
实施例二,本发明为一种离子注入机离子源用钨铼丝的制备方法,它包括如下步骤:Embodiment two, the present invention is a kind of preparation method of tungsten-rhenium wire for ion source of ion implanter, it comprises the following steps:
a.原料:以浸泡方式在蓝钨中掺杂钾、硅、铝,以高铼酸铵溶液的形式加入的铼,经搅拌、蒸发、干燥,还原得到钨铼合金粉末;a. Raw material: dope potassium, silicon and aluminum in blue tungsten by soaking, add rhenium in the form of ammonium perrhenate solution, stir, evaporate, dry, and reduce to obtain tungsten-rhenium alloy powder;
b.压型:将钨铼合金粉末压制成型;b. Molding: pressing tungsten-rhenium alloy powder into shape;
c.预烧结:粉末经压型,在1200~1100℃氢气中预烧结,预烧结时间为0.8小时;c. Pre-sintering: The powder is pressed and pre-sintered in hydrogen at 1200-1100 ° C. The pre-sintering time is 0.8 hours;
d.烧结:经预烧结后的坯条在2800~2900℃温度和氢气保护下高温垂熔烧结,垂熔烧结时间为1.5小时;d. Sintering: The pre-sintered billet is sintered at a temperature of 2800-2900°C under the protection of hydrogen, and the vertical melting sintering time is 1.5 hours;
e.开坯:将粗的坯条逐渐加工至可以拉拔的尺寸;e. Billet opening: gradually process the thick billet to the size that can be drawn;
f.拉丝:将经过开坯的垂熔条锻轧、拉拔得到掺杂钨铼合金杆,其成份及含量:铼:0.6wt.%,钾:80PPm,硅:8PPm,铝:10PPm,余量为钨。f. Wire drawing: forging, rolling and drawing the vertical melting rod after billeting to obtain a doped tungsten-rhenium alloy rod, its composition and content: rhenium: 0.6wt.%, potassium: 80PPm, silicon: 8PPm, aluminum: 10PPm, and The amount is tungsten.
g.成型:将上述的钨铼合金杆矫直、切割成所需尺寸。g. Forming: Straighten and cut the above-mentioned tungsten-rhenium alloy rod into required size.
经过上述七步工序后,即可得到钨铼合金杆,其晶粒宽度比大于10,下垂值为0.8,其高温金相组织如图3所示。After the above seven-step process, a tungsten-rhenium alloy rod can be obtained, with a grain width ratio greater than 10 and a sag value of 0.8. The high-temperature metallographic structure is shown in Figure 3 .
实施例三,本发明为一种离子注入机离子源用钨钨铼丝的制备方法,它包括如下步骤:Embodiment three, the present invention is a preparation method of tungsten-tungsten-rhenium wire for ion source of ion implanter, which comprises the following steps:
a.原料:以浸泡方式在蓝钨中掺杂钾、硅、铝,以高铼酸铵溶液的形式加入的铼,经搅拌、蒸发、干燥,还原得到钨铼合金粉末;a. Raw material: dope potassium, silicon and aluminum in blue tungsten by soaking, add rhenium in the form of ammonium perrhenate solution, stir, evaporate, dry, and reduce to obtain tungsten-rhenium alloy powder;
b.压型:将钓钨铼合金粉末压制成型;b. Molding: pressing tungsten-rhenium alloy powder into shape;
c.预烧结:粉末经压型,在1300~1400℃氢气中预烧结,预烧结时间为0.1小时;c. Pre-sintering: The powder is pressed and pre-sintered in hydrogen at 1300-1400 ° C. The pre-sintering time is 0.1 hour;
d.烧结:经预烧结后的坯条在2800~2900℃温度和氢气保护下高温垂熔烧结,垂熔烧结时间为1.8小时;d. Sintering: The pre-sintered billet is sintered at a temperature of 2800-2900 °C under the protection of hydrogen at high temperature, and the vertical melting sintering time is 1.8 hours;
e.开坯:将粗的坯条逐渐加工至可以拉拔的尺寸;e. Billet opening: gradually process the thick billet to the size that can be drawn;
f.拉丝:将经过开坯的垂熔条锻轧、拉拔得到掺杂钨铼合金杆,其成份及含量:铼:0.8wt.%,钾:100PPm,硅:10PPm,铝:15PPm,余量为钨。f. Wire drawing: forging, rolling and drawing the vertical melting rod after billeting to obtain a doped tungsten-rhenium alloy rod, its composition and content: rhenium: 0.8wt.%, potassium: 100PPm, silicon: 10PPm, aluminum: 15PPm, and The amount is tungsten.
g.成型:将上述的钨铼合金杆矫直、切割成所需尺寸。g. Forming: Straighten and cut the above-mentioned tungsten-rhenium alloy rod into required size.
经过上述七步工序后,即可得到钨铼合金丝,其晶粒宽度比大于10,下垂值为0.6,其高温金相组织如图4所示。After the above seven-step process, the tungsten-rhenium alloy wire can be obtained, the grain width ratio is greater than 10, the sag value is 0.6, and its high-temperature metallographic structure is shown in Figure 4.
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US20140170312A1 (en) * | 2012-12-14 | 2014-06-19 | Smith International, Inc. | Method of making rhenium coating |
CN104004951B (en) * | 2014-06-06 | 2016-06-01 | 江苏峰峰钨钼制品股份有限公司 | A kind of tungsten basal body Alloy And Preparation Method |
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